機器(委託対応)の詳細情報

Detailed Information of Equipment(Job Request)

Equipment and Job Request Information
Affiliation R&D Center for Innovative Material Characterization (IMC)
Category Electron Microscopes
Equipment (Job Request) (Advanced SEM)JIB-4000 Focused Ion Beam Milling & Imaging System
Supplier (Equipment type) JEOL(JIB-4000)

Specification・Features

The JIB-4000PLUS is a focused ion beam milling & imaging system (single-beam FIB system) featuring a high-performance ion optical column. The accelerated Ga (gallium) ion beam is focused onto a specimen to enable SIM image observation of the specimen surface, milling, and deposition of materials like carbon or tungsten. The system also enables preparation of a thin-film specimen for TEM imaging and a cross-section specimen for observing the interior of the specimen. In addition, the JIB-4000PLUS can be equipped with a 3D observation function and an automatic TEM specimen preparation function; thus the system meets a variety of needs for specimen preparations.

Ion source Ga liquid metal ion source
Accelerating voltage 1 to 30 kV (in 5 steps)
Magnification ×60 (for searching a field)
×200 to ×300,000
Image resolution 5nm (at 30 kV)
Maximum beam current 60nA (at 30 kV)
90nA (at 30 kV)*Optional
Movable aperture 12 steps (motor drive)
Processing shapes by milling Rectangle, line and spot
Installation site Project and Research Building 104
Remark
Research Accomplishment
Inquiry 利用相談はこちらより必要事項をご記入の上、お問い合わせください。
機器担当者 担当者:塔村
所属:イノベイティブ計測技術開発研究センター
University-wide
Shared Use Rate
2,280 Yen / 30 min.
Picture