機器(委託対応)の詳細情報

Detailed Information of Equipment(Job Request)

Equipment and Job Request Information
Affiliation Faculty of Pure and Applied Sciences
Category LSI Process Equipment
Equipment (Job Request) Mask aligner Q 2001CT
Supplier (Equipment type) Neutronix-Quintel (Q 2001CT)

Specification・Features

Contact aligner using a 2.5 inche-square mask
Interval between mask and wafer; 0-180μm
Sample size; 1cm square to 4 inches in diameter
Mask size; 2.5 inche- or 5 inche-square
Light source; 200 W mercury lamp (350~450 nm)
Resolution; 0.6-1.0μm
Manual alignment; 1.0μm
Illuminance distribution, <= 5%@3.5 inch φ
Installation site Cooperative Research Building C 107
Remark
Research Accomplishment
Inquiry 利用相談はこちらより必要事項をご記入の上、お問い合わせください。
機器担当者 担当者:微細加工PFスタッフ
University-wide
Shared Use Rate
200 Yen / 30 min.
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